VESTA’s VULCAN(TM) Metal ALD/VPD System can provide in-situ and/or sequential dual mode of ALD with VPD processing capability. VESTA’s dual mode deposition technology integrates a precision ALD for initial layers with high throughput from various type of deposition obtained from gas phase of chemicals such as pseudo-ALD, pseudo-CVD, CVD, etc for bulk layers. Both the initial ALD layer and the VPD fill are deposited within the same VULCAN(TM) Process Module with or without plasma option.

The integration of in-situ and/or sequential deposition approach overcomes both the film quality limitation of CVD processing and the low deposition rate limitation of ALD processing. By adopting plasma technology, low temperature deposition is achieved for gate electrodes, back-end-of the line (BEOL) applications, and applications utilizing polymeric substrates.

“We are pleased with the latest addition to our ALD System product portfolio. Evolution of our core technology further strengthens and broadens our complete offering of Atomic Layer Deposition Process solutions,” said Chuck Kim, executive director of VESTA Technology. “Through partnership with ATDF (Advanced Technology Development Facility), an independent subsidiary of SEMATECH Inc., our advanced R&D and Customer Demonstration facility enables VESTA Technology to continue to provide our customers with innovative and leading-edge technology solutions to address today’s semiconductor device manufacturing challenges. Our complete ALD portfolio further positions VESTA Technology as a leading global supplier in our industry.”

With the evolution of VESTA’s ALD System, VESTA can provide complete ALD technology solution with technical flexibility of single wafer processing and the versatility of plasma capability for production requirement. VESTA’s ALD System’s success is due to its ability to offer revolutionary technology and proven production reliability with progressed developments for improved productivity performance.

For more information please visit us at our Booth #5486 (North Hall) SEMICON West 2005 — San Francisco, or visit our website at www.vestatechnology.com.

About VESTA Technology, Inc.: VESTA, headquartered in San Jose, Calif. is a leading supplier of next generation thermal processing and deposition solutions to the global semiconductor and nano-technology industries. VESTA’s R&D and Demo facilities are located in Austin, Texas. IPS Ltd., located in Pyungtaek, S. Korea is an exclusive partner and equipment provider to VESTA with an exclusive technology license and world-wide distributorship agreement.